G71................??

kkkokkk0

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Theinq报道,nVIDIA新一代高端图形芯片G71采用和Geforce 7800GTX相同的PCB,G71和G70不同之处在于散热风扇和显存容量。G71现在内部的称呼是“更快的G70”,Theinq获悉几张G71样品的核心速度已经达到800MHz,显示G71核心采用优化之后的110nm制程,但是Theinq表示,他们不清楚G71在何种环境当中达到800MHz的核心速度,但是据称G71采用双插槽的风冷散热风扇,而不是水冷或者半导体制冷。Theinq表示,G71样卡的散热系统分成2部分,中间采用72或者80mm的风扇,2部分都采用大型的铝制散热鳍,散热鳍当中有2条热管,将图形核心散发的热量带走,G71背面和Geforce 7800GTX完全相同,都采用塑料材质的GDDR3散热片,塑料材质的PCB固定件。Theinq给出了可能是Geforce 7800 Ultra名称的G71基本参数:

-110nm制程,谨慎修订的GPU
-出人意料的核心频率(800MHz?)
-双插槽铝制散热风扇,至少4条热管
-超静音,大型散热鳍,大型散热风扇
-512MB GDDR3显存,三星提供,显存参数未知。

以上轉貼來源:http://www.zenha.net/
 

FalconHero

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核心頻率預設就是800MHZ :o||: ~~
 

luger

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該不會就是衝者R520來的吧 :o||: :o||:
 

MUS

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Theinq是謠指部,對於他的新聞請先抱持著姑且望之的心態即可~ :lol:
 

jks56k

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著真的太誇張了吧 :p||: :p||: ;ng; ;ng;
連我6200顯示卡上的3.6ns記憶體都超不上800 ;cr; ;cr; 何況是核心 :fi: :fi:
 

NV45

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NV 人說G71是2倍NV43效能
所以要花1萬多~8000買X800或NV40很不值得
以後兩張只要1萬多就有6800U SLI效能


C/P大戰及將暴發

800MHz是NV測試的,測試TSMC的良率
R520設定是在700MHz但是因為leakage與電壓問題,最候只可能620~650
而且R520良率比G70差,Defective的部份多同時而且R520可能只有250~275M,理論效能差於G70(defective的部份多很多),必須提高頻率

RV530/RV515令人玩味的是設計成可能面積小G7X系列一些

ATI只要這次R520在同樣條件上狂輸G70,RV530/RV515也會狂輸

但R5XX的架構已經不能用G70的眼光來看
到底用X360的C1技術延襲而來,可以有多少的幫助
 

steven_jou0407

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Originally posted by NV45@Jul 19 2005, 06:54 PM



C/P大戰及將暴發
那那一張才是c/p王咧!!

nt16000 78GTX

us499 20開24燈管 78gt

還是800M G71???

還是傳說中a1 32管 78U阿??

我都搞昏了~~
 

NV45

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Originally posted by steven_jou0407+Jul 19 2005, 07:00 PM--></div><table border='0' align='center' width='95%' cellpadding='3' cellspacing='1'><tr><td>QUOTE (steven_jou0407 @ Jul 19 2005, 07:00 PM)</td></tr><tr><td id='QUOTE'> <!--QuoteBegin-NV45@Jul 19 2005, 06:54 PM



C/P大戰及將暴發
那那一張才是c/p王咧!!

nt16000 78GTX

us499 20開24燈管 78gt

還是800M G71???

還是傳說中a1 32管 78U阿??

我都搞昏了~~ [/b][/quote]
800MHz G71是不可能的
1.電壓高
2.能達到的很少,只有在晶圓中間那部份可以達到


我之所以看好G71GT SLI的原因是價位還有是2X6800U 效能

頻率這個東西要跟電壓搭配,800MHz是想太多

78U這個東西是要看ATI反應,不是110nm的高電壓板G70 (500/1400)
或是90nm的G7X
 

NV45

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聽聽別人怎麼說
http://www.beyond3d.com/forum/viewtopic.ph...r=asc&start=800

OK. Before you even tape out the chip, you will know what types of power thresholds the chip will have ergo the theoretical target clock-speed can be calculated based on the maximum rated voltage for the process.

Now, silicon wise, as far as I can see (I’m sure there are EE’s around that will correct me) there are two main things that affect yield:

Defects: These are random issues on the silicon wafer itself, such as the silicon has not formed properly, perhaps due to a spec of dust around, or the like. On each wafer there are expected to be a number of defects and this can screw up a chip (or part of a chip).

Location: Generally speaking, so its said, the chips towards the centre of the wafer reach closer to their projected theoretical clock peaks than those towards the edge. The only vague explanation I’ve had for this so far down to the positioning of the laser when the chips are being fabricated it more optimal in the centre.

Now, of these two, defects will only affect the number of chips that each wafer will “yield” in an acceptably working fashion – the bigger the chip the more chance there is that more chips on the wafer will but fabricated on an area of the die where a defect exists; for this reason we are seeing more redundancy introduced defects are the main cause of lower performance SKU’s that have blocks disabled. The location on the wafer dictates the clockspeeds of the SKU’s – once you have cut a number of wafers you can begin to assess what clockspeeds the range of fully working chips are hitting the chips can be speed-binned for SKU categorisation via clockspeed.

Picking an arbitrary number out of the air, lets say that ATI’s calculations suggest that for the voltage their 90nm process options should be able to operate at, combined their chip projections, they could reach a theoretical target of 800MHz, which would their top end SKU may potentially reach towards (but factoring in the location issues, many/most of the chips will fall even further below this). But, another variable is yield variable is creeping in more a more frequently with smaller processes: leakage. Should a chip suffer from leakage issues this means that they may have to lower the core voltage to circumvent the issue, the net effect of lowering the core voltage the chips operate at would be to lower the clock-speed targets, not necessarily just the theoretical top end target, but potentially all those across the wafer as well.

Should leakage be the issue with R520 and the reports of chips running at 600MHz are ones that are operating at a reduced voltage, removing/reducing the leakage issue should enable them to bring the voltage back up to what the process can actually handle, hence increase the yield at higher clock rates.

(Any EE’s out there, please feel free to point out any errors in this analysis, and also point out other factors that may have a bearing on yields)
 
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